McCormick School of Engineering, Northwestern University

Andreas Waechter

Associate Professor of Industrial Engineering & Management Sciences

Education

Ph.D., Chemical Engineering, Carnegie Mellon University, Pittsburgh,PA

M.S. Mathematics, University of Cologne, Germany

Research Interests

Large-scale nonlinear continuous optimization; mixed-inter nonlinear optimization; open source software implementation; application of optimization algorithms to industrial and scientific problems

Selected Publications

• C. D'Ambrosio, J. Lee, A. Waechter, J. Lee and S. Leyffer, “AN ALGORITHMIC FRAMEWORK FOR MINLP WITH SEPARABLE NON-CONVEXITY”, Mixed Integer Nonlinear Programming, (2012)
• D. O. S. Melville, A. E. Rosenbluth, A. Waechter, M. Millstone, J. Tirapu-Azpiroz, K. Tian, K. Lai, T. Inoue, M. Sakamoto, K. Adam and A. Tritchkov, “Computational lithography: Exhausting the resolution limits of 193-nm projection lithography systems”, Journal of Vacuum Science & Technology B, (2011)
• Lee, J.; Leyffer, S.; Bonami, P.; Wächter, A., “More Branch-and-Bound Experiments in Convex Nonlinear Integer Programming”, , (2011)
• Wächter, A.; Schenk, O.; Curtis, F.; Huber, J., “On the Implementation of an Interior-Point Algorithm for Nonlinear Optimization with Inexact Step Computations”, , (2011)
• Lee, J.; Margot, F.; Wächter, A.; Nannicini, G.; Belotti, P., “A probing algorithm for MINLP with failure prediction by SVM”, Integration of AI and OR Techniques in Constraint Programming for Combinatorial Optimization Problems, (2011)
• K. Lai;M. Gabrani;D. Demaris;N. Casati;A. Torres;S. Sarkar;P. Strenski;S. Bagheri;D. Scarpazza;A. E. Rosenbluth;D. O. Melville;A. Waechter;J. Lee;V. Austel;M. Szeto-Millstone;K. Tian;F. Barahona;T. Inoue;M. Sakamoto;MV Dusa, “Design Specific Joint Optimization of Masks and Sources on a Very Large Scale”, Optical Microlithography Xxiv, (2011)
• Poliakov, P.; Anchlia, A.; Bardon, M.G.; Rooseleer, B.; De Wachter, B., “Circuit design for bias compatibility in novel FinFET-based floating-body RAM”, Circuits and Systems II: Express Briefs, IEEE Transactions on, (2010)
• David Melville;Alan E. Rosenbluth;Kehan Tian;Kafai Lai;Saeed Bagheri;Jaione Tirapu-Azpiroz;Jason Meiring;Scott Halle;Greg McIntyre;Tom Faure;Daniel Corliss;Azalia Krasnoperova;Lei Zhuang;Phil Strenski;Andreas Waechter;Laszlo Ladanyi;Francisco Barahona;Daniele Scarpazza;Jon Lee;Tadanobu Inoue;Masaharu Sakamoto;Hidemasa Muta;Alfred Wagner;Geoffrey Burr;Young Kim;Emily Gallagher;Mike Hibbs;Alexander Tritchkov;Yuri Granik;Moutaz Fakhry;Kostas Adam;Gabriel Berger;Michael Lam;Aasutosh Dave;Nick Cobb;MV Dusa;W Conley, “Demonstrating the Benefits of Source-Mask Optimization and Enabling Technologies through Experiment and Simulations”, Optical Microlithography Xxiii, (2010)