Faculty Directory
Andreas Waechter

Associate Professor of Industrial Engineering & Management Sciences


2145 Sheridan Road
Tech E280
Evanston, IL 60208-3109

Email Andreas Waechter


Andreas Waechter's Homepage


Industrial Engineering and Management Sciences


Ph.D., Chemical Engineering, Carnegie Mellon University, Pittsburgh,PA

M.S. Mathematics, University of Cologne, Germany

Research Interests

Large-scale nonlinear continuous optimization; mixed-integer nonlinear optimization; open source software implementation; application of optimization algorithms to industrial and scientific problems

Selected Publications

  • Frank E. Curtis, Andreas Waechter, Victor M. Zavala, “A Sequential Algorithm for Solving Nonlinear Optimization Problems with Chance Constraints”, , (2016)
  • Francisco Jara-Moroni, Jong Shi Pang, Andreas Waechter, “A Study of the Difference-of-Convex Approach for Solving Linear Programs with Complementarity Constraints”, , (2016)
  • Dennis Janka, Christian Kirches, Sebastian Sager, Andreas Wchter, “An SR1/BFGS SQP algorithm for nonconvex nonlinear programs with block-diagonal Hessian matrix”, Mathematical Programming Computation, (2016)
  • N. Keskar, J. Nocedal, F. ztoprak, A. Wchter, “A second-order method for convex -regularized optimization with active-set prediction”, Optimization Methods and Software, (2016)
  • Travis C. Johnson, Christian Kirches, Andreas Wchter, “An active-set method for quadra tic programming based on sequential hot-starts”, SIAM Journal on Optimization, (2015)
  • Curtis, Frank E.; Huber, Johannes; Schenk, Olaf; Wchter, Andreas, “A note on the implementation of an interior-point algorithm for nonlinear optimization with inexact step computations”, Mathematical Programming, (2012)
  • C. D'Ambrosio, J. Lee, A. Waechter, J. Lee and S. Leyffer, “AN ALGORITHMIC FRAMEWORK FOR MINLP WITH SEPARABLE NON-CONVEXITY”, Mixed Integer Nonlinear Programming, (2012)
  • D. O. S. Melville, A. E. Rosenbluth, A. Waechter, M. Millstone, J. Tirapu-Azpiroz, K. Tian, K. Lai, T. Inoue, M. Sakamoto, K. Adam and A. Tritchkov, “Computational lithography: Exhausting the resolution limits of 193-nm projection lithography systems”, Journal of Vacuum Science & Technology B, (2011)